%0 Journal Article %1 journals/apin/ShiCLC24 %A Shi, Yumeng %A Cai, Yu %A Lou, Shunyuan %A Chen, Yining %D 2024 %J Appl. Intell. %K dblp %N 1 %P 246-263 %T Explainable prediction of deposited film thickness in IC fabrication with CatBoost and SHapley Additive exPlanations (SHAP) models. %U http://dblp.uni-trier.de/db/journals/apin/apin54.html#ShiCLC24 %V 54

@article{journals/apin/ShiCLC24, added-at = {2024-02-10T00:00:00.000+0100}, author = {Shi, Yumeng and Cai, Yu and Lou, Shunyuan and Chen, Yining}, biburl = {https://www.bibsonomy.org/bibtex/2eb79a9e051a56a16a1d626dd43607312/dblp}, ee = {https://doi.org/10.1007/s10489-023-05121-2}, interhash = {2eabad7f35ee6ed5fdd6e1bf2f1c31ab}, intrahash = {eb79a9e051a56a16a1d626dd43607312}, journal = {Appl. Intell.}, keywords = {dblp}, month = {January}, number = 1, pages = {246-263}, timestamp = {2024-04-09T02:37:37.000+0200}, title = {Explainable prediction of deposited film thickness in IC fabrication with CatBoost and SHapley Additive exPlanations (SHAP) models.}, url = {http://dblp.uni-trier.de/db/journals/apin/apin54.html#ShiCLC24}, volume = 54, year = 2024 }