%0 Journal Article %1 journals/tie/TayCWN10 %A Tay, Arthur %A Chua, Hui Tong %A Wang, Yuheng %A Ngo, Yit Sung %D 2010 %J IEEE Trans. Ind. Electron. %K dblp %N 3 %P 1112-1119 %T Equipment Design and Control of Advanced Thermal-Processing Module in Lithography. %U http://dblp.uni-trier.de/db/journals/tie/tie57.html#TayCWN10 %V 57

@article{journals/tie/TayCWN10, added-at = {2020-10-26T00:00:00.000+0100}, author = {Tay, Arthur and Chua, Hui Tong and Wang, Yuheng and Ngo, Yit Sung}, biburl = {https://www.bibsonomy.org/bibtex/2822ae8c265c42a38fc2835f3357dae62/dblp}, ee = {https://doi.org/10.1109/TIE.2009.2026230}, interhash = {7c29a10bfd9724d594d20896f95ce7ad}, intrahash = {822ae8c265c42a38fc2835f3357dae62}, journal = {IEEE Trans. Ind. Electron.}, keywords = {dblp}, number = 3, pages = {1112-1119}, timestamp = {2020-10-27T11:38:57.000+0100}, title = {Equipment Design and Control of Advanced Thermal-Processing Module in Lithography.}, url = {http://dblp.uni-trier.de/db/journals/tie/tie57.html#TayCWN10}, volume = 57, year = 2010 }