Zusammenfassung
We study inhomogeneous doping effects on the confinement properties of
modulation-doped single nonabrupt GaAs/AlxGa1-xAs quantum wells. We
describe the inhomogeneous doping using error function profiles, and we
solve self-consistently the coupled Schrodinger (with a position
dependent kinetic energy operator) and Poisson equations to obtain the
electron energy levels. When the nonabrupt interfaces (space layer) are
10 Angstrom (100 Angstrom) wide and the presence of Si-dopant density in
a 100 Angstrom GaAs well region is only 10% of the Si-dopant density in
the Al0.3Ga0.7As barriers, the lowest intersubband transition energy
increases 37 meV in comparison with that calculated within the
homogeneous doping-abrupt interface picture. (C) 1999 Academic Press.
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