%0 Journal Article %1 mostegel2015versatile %A Mostegel, Florian H. %A Ducker, Robert E. %A Rieger, Paul H. %A El Zubir, Osama %A Xia, Sijing %A Radl, Simone V. %A Edler, Matthias %A Cartron, Michael L. %A Hunter, C. Neil %A Leggett, Graham J. %A Griesser, Thomas %D 2015 %I The Royal Society of Chemistry %J J. Mater. Chem. B %K acrylate nextgen phoktopatterning polymer thiol %N 21 %P 4431--4438 %R 10.1039/C5TB00345H %T Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules %U http://dx.doi.org/10.1039/C5TB00345H %V 3 %X Thiol-based chemistry provides a mild and versatile tool for surface functionalization. In the present work, mercaptosilane films were patterned by utilizing UV-induced photo-oxidation of the thiol to yield sulfonate groups via contact and interferometric lithography (IL). These photo-generated sulfonic acid groups were used for selective immobilization of amino-functionalized molecules after activation with triphenylphosphine ditriflate (TPPDF). Moreover, protein-resistant poly(oligoethyleneglycolmethacrylate) (POEGMA) brushes were grown from the intact thiol groups by a surface-induced polymerization reaction. Exploiting both reactions it is possible to couple amino-labelled nitrilotriacetic acid (NH2-NTA) to sulfonate-functionalized regions, enabling the site-specific binding of green fluorescent protein (GFP) to regions defined lithographically, while exploiting the protein-resistant character of POEGMA brushes to prevent non-specific protein adsorption to previously masked areas. The outstanding reactivity of thiol groups paves the way towards novel strategies for the fabrication of complex protein nanopatterns beyond thiol-ene chemistry.

@article{mostegel2015versatile, abstract = {Thiol-based chemistry provides a mild and versatile tool for surface functionalization. In the present work{,} mercaptosilane films were patterned by utilizing UV-induced photo-oxidation of the thiol to yield sulfonate groups via contact and interferometric lithography (IL). These photo-generated sulfonic acid groups were used for selective immobilization of amino-functionalized molecules after activation with triphenylphosphine ditriflate (TPPDF). Moreover{,} protein-resistant poly(oligoethyleneglycolmethacrylate) (POEGMA) brushes were grown from the intact thiol groups by a surface-induced polymerization reaction. Exploiting both reactions it is possible to couple amino-labelled nitrilotriacetic acid (NH2-NTA) to sulfonate-functionalized regions{,} enabling the site-specific binding of green fluorescent protein (GFP) to regions defined lithographically{,} while exploiting the protein-resistant character of POEGMA brushes to prevent non-specific protein adsorption to previously masked areas. The outstanding reactivity of thiol groups paves the way towards novel strategies for the fabrication of complex protein nanopatterns beyond thiol-ene chemistry.}, added-at = {2017-02-20T09:17:00.000+0100}, author = {Mostegel, Florian H. and Ducker, Robert E. and Rieger, Paul H. and El Zubir, Osama and Xia, Sijing and Radl, Simone V. and Edler, Matthias and Cartron, Michael L. and Hunter, C. Neil and Leggett, Graham J. and Griesser, Thomas}, biburl = {https://www.bibsonomy.org/bibtex/20d5e13610e1d1c877dbc3d69b2edc0bb/bkoch}, description = {Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules - Journal of Materials Chemistry B (RSC Publishing) DOI:10.1039/C5TB00345H}, doi = {10.1039/C5TB00345H}, interhash = {86868b52a2f79299d947e7679b089e48}, intrahash = {0d5e13610e1d1c877dbc3d69b2edc0bb}, journal = {J. Mater. Chem. B}, keywords = {acrylate nextgen phoktopatterning polymer thiol}, number = 21, pages = {4431--4438}, publisher = {The Royal Society of Chemistry}, timestamp = {2017-02-20T09:17:00.000+0100}, title = {Versatile thiol-based reactions for micrometer- and nanometer-scale photopatterning of polymers and biomolecules}, url = {http://dx.doi.org/10.1039/C5TB00345H}, volume = 3, year = 2015 }