%0 Conference Paper %1 conf/vlsit/ZhangLNSAY23 %A Zhang, Zhuocheng %A Lin, Zehao %A Niu, Chang %A Si, Mengwei %A Alam, Muhammad Ashraful %A Ye, Peide D. %B VLSI Technology and Circuits %D 2023 %I IEEE %K dblp %P 1-2 %T Ultrahigh Bias Stability of ALD In2O3 FETs Enabled by High Temperature O2 Annealing. %U http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#ZhangLNSAY23 %@ 978-4-86348-806-9

@inproceedings{conf/vlsit/ZhangLNSAY23, added-at = {2023-07-28T00:00:00.000+0200}, author = {Zhang, Zhuocheng and Lin, Zehao and Niu, Chang and Si, Mengwei and Alam, Muhammad Ashraful and Ye, Peide D.}, biburl = {https://www.bibsonomy.org/bibtex/2fb4d0e744e2c1b95e8f4c2b13040f6b0/dblp}, booktitle = {VLSI Technology and Circuits}, crossref = {conf/vlsit/2023}, ee = {https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185292}, interhash = {239188c27c029c580dcd2909764fcf0a}, intrahash = {fb4d0e744e2c1b95e8f4c2b13040f6b0}, isbn = {978-4-86348-806-9}, keywords = {dblp}, pages = {1-2}, publisher = {IEEE}, timestamp = {2024-04-09T19:13:01.000+0200}, title = {Ultrahigh Bias Stability of ALD In2O3 FETs Enabled by High Temperature O2 Annealing.}, url = {http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#ZhangLNSAY23}, year = 2023 }