%0 Conference Paper %1 conf/irps/LeeLKAKHRBLLKP24 %A Lee, Sunhang %A Lee, Nam-Hyun %A Kim, G.-J. %A Ahn, J. %A Kim, Ik-Hwan %A Ha, S. %A Rhee, S. %A Bae, GH %A Lee, KW %A Lee, YS %A Ko, SB. %A Pae, S. %B IRPS %D 2024 %I IEEE %K dblp %P 69 %T Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology. %U http://dblp.uni-trier.de/db/conf/irps/irps2024.html#LeeLKAKHRBLLKP24 %@ 979-8-3503-6976-2

@inproceedings{conf/irps/LeeLKAKHRBLLKP24, added-at = {2024-07-08T00:00:00.000+0200}, author = {Lee, Sunhang and Lee, Nam-Hyun and Kim, G.-J. and Ahn, J. and Kim, Ik-Hwan and Ha, S. and Rhee, S. and Bae, GH and Lee, KW and Lee, YS and Ko, SB. and Pae, S.}, biburl = {https://www.bibsonomy.org/bibtex/2f26a193e2dadfb316186908fafdc60e1/dblp}, booktitle = {IRPS}, crossref = {conf/irps/2024}, ee = {https://doi.org/10.1109/IRPS48228.2024.10529478}, interhash = {3c16dd8cd3c980c9f959d6cd836c880e}, intrahash = {f26a193e2dadfb316186908fafdc60e1}, isbn = {979-8-3503-6976-2}, keywords = {dblp}, pages = 69, publisher = {IEEE}, timestamp = {2024-07-15T07:17:47.000+0200}, title = {Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology.}, url = {http://dblp.uni-trier.de/db/conf/irps/irps2024.html#LeeLKAKHRBLLKP24}, year = 2024 }