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%0 Conference Paper
%1 conf/irps/LeeLKAKHRBLLKP24
%A Lee, Sunhang
%A Lee, Nam-Hyun
%A Kim, G.-J.
%A Ahn, J.
%A Kim, Ik-Hwan
%A Ha, S.
%A Rhee, S.
%A Bae, GH
%A Lee, KW
%A Lee, YS
%A Ko, SB.
%A Pae, S.
%B IRPS
%D 2024
%I IEEE
%K dblp
%P 69
%T Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology.
%U http://dblp.uni-trier.de/db/conf/irps/irps2024.html#LeeLKAKHRBLLKP24
%@ 979-8-3503-6976-2
@inproceedings{conf/irps/LeeLKAKHRBLLKP24,
added-at = {2024-07-08T00:00:00.000+0200},
author = {Lee, Sunhang and Lee, Nam-Hyun and Kim, G.-J. and Ahn, J. and Kim, Ik-Hwan and Ha, S. and Rhee, S. and Bae, GH and Lee, KW and Lee, YS and Ko, SB. and Pae, S.},
biburl = {https://www.bibsonomy.org/bibtex/2f26a193e2dadfb316186908fafdc60e1/dblp},
booktitle = {IRPS},
crossref = {conf/irps/2024},
ee = {https://doi.org/10.1109/IRPS48228.2024.10529478},
interhash = {3c16dd8cd3c980c9f959d6cd836c880e},
intrahash = {f26a193e2dadfb316186908fafdc60e1},
isbn = {979-8-3503-6976-2},
keywords = {dblp},
pages = 69,
publisher = {IEEE},
timestamp = {2024-07-15T07:17:47.000+0200},
title = {Effect of Off-State Stress on Data-Valid Window Margin for Advanced DRAM Using HK/MG Process Technology.},
url = {http://dblp.uni-trier.de/db/conf/irps/irps2024.html#LeeLKAKHRBLLKP24},
year = 2024
}