%0 Conference Paper %1 conf/dac/YuSP06 %A Yu, Peng %A Shi, Sean X. %A Pan, David Z. %B DAC %D 2006 %E Sentovich, Ellen %I ACM %K dblp %P 785-790 %T Process variation aware OPC with variational lithography modeling. %U http://dblp.uni-trier.de/db/conf/dac/dac2006.html#YuSP06 %@ 1-59593-381-6

@inproceedings{conf/dac/YuSP06, added-at = {2018-11-06T00:00:00.000+0100}, author = {Yu, Peng and Shi, Sean X. and Pan, David Z.}, biburl = {https://www.bibsonomy.org/bibtex/28c9a9edc637bce522be4dede25735cc1/dblp}, booktitle = {DAC}, crossref = {conf/dac/2006}, editor = {Sentovich, Ellen}, ee = {https://doi.org/10.1145/1146909.1147108}, interhash = {64d5f716410e2ebc1483c27da0c6257d}, intrahash = {8c9a9edc637bce522be4dede25735cc1}, isbn = {1-59593-381-6}, keywords = {dblp}, pages = {785-790}, publisher = {ACM}, timestamp = {2018-11-07T15:12:24.000+0100}, title = {Process variation aware OPC with variational lithography modeling.}, url = {http://dblp.uni-trier.de/db/conf/dac/dac2006.html#YuSP06}, year = 2006 }