Article,

An Approach to Optimize Regimes of Manufacturing of Complementary Horizontal Field-Effect Transistor

, and .
International Journal of Recent advances in Physics (IJRAP), 3 (2): 19 (May 2014)
DOI: 10.14810/ijrap.2014.3205

Abstract

In this paper we consider nonlinear model to describe manufacturing complementary horizontal field-effect heterotransistor. Based on analytical solution of the considered boundary problems some recommendations have been formulated to optimize technological processes.

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