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%0 Conference Paper
%1 conf/cicc/SuSLYLXCHCDH03
%A Su, Ke-Wei
%A Sheu, Yi-Ming
%A Lin, Chung-Kai
%A Yang, Sheng-Jier
%A Liang, Wen-Jya
%A Xi, Xuemei
%A Chiang, Chung-Shi
%A Her, Jaw-Kang
%A Chia, Yu-Tai
%A Diaz, Carlos H.
%A Hu, Chenming
%B CICC
%D 2003
%I IEEE
%K dblp
%P 245-248
%T A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics.
%U http://dblp.uni-trier.de/db/conf/cicc/cicc2003.html#SuSLYLXCHCDH03
%@ 0-7803-7842-3
@inproceedings{conf/cicc/SuSLYLXCHCDH03,
added-at = {2021-11-15T00:00:00.000+0100},
author = {Su, Ke-Wei and Sheu, Yi-Ming and Lin, Chung-Kai and Yang, Sheng-Jier and Liang, Wen-Jya and Xi, Xuemei and Chiang, Chung-Shi and Her, Jaw-Kang and Chia, Yu-Tai and Diaz, Carlos H. and Hu, Chenming},
biburl = {https://www.bibsonomy.org/bibtex/25a9306f1d3fb6ad2699314fe9f36b530/dblp},
booktitle = {CICC},
crossref = {conf/cicc/2003},
ee = {https://doi.org/10.1109/CICC.2003.1249396},
interhash = {7d2776ebeb3245bc4b0072ed65e39c13},
intrahash = {5a9306f1d3fb6ad2699314fe9f36b530},
isbn = {0-7803-7842-3},
keywords = {dblp},
pages = {245-248},
publisher = {IEEE},
timestamp = {2024-04-09T19:39:32.000+0200},
title = {A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics.},
url = {http://dblp.uni-trier.de/db/conf/cicc/cicc2003.html#SuSLYLXCHCDH03},
year = 2003
}