%0 Conference Paper %1 conf/cicc/SuSLYLXCHCDH03 %A Su, Ke-Wei %A Sheu, Yi-Ming %A Lin, Chung-Kai %A Yang, Sheng-Jier %A Liang, Wen-Jya %A Xi, Xuemei %A Chiang, Chung-Shi %A Her, Jaw-Kang %A Chia, Yu-Tai %A Diaz, Carlos H. %A Hu, Chenming %B CICC %D 2003 %I IEEE %K dblp %P 245-248 %T A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics. %U http://dblp.uni-trier.de/db/conf/cicc/cicc2003.html#SuSLYLXCHCDH03 %@ 0-7803-7842-3

@inproceedings{conf/cicc/SuSLYLXCHCDH03, added-at = {2021-11-15T00:00:00.000+0100}, author = {Su, Ke-Wei and Sheu, Yi-Ming and Lin, Chung-Kai and Yang, Sheng-Jier and Liang, Wen-Jya and Xi, Xuemei and Chiang, Chung-Shi and Her, Jaw-Kang and Chia, Yu-Tai and Diaz, Carlos H. and Hu, Chenming}, biburl = {https://www.bibsonomy.org/bibtex/25a9306f1d3fb6ad2699314fe9f36b530/dblp}, booktitle = {CICC}, crossref = {conf/cicc/2003}, ee = {https://doi.org/10.1109/CICC.2003.1249396}, interhash = {7d2776ebeb3245bc4b0072ed65e39c13}, intrahash = {5a9306f1d3fb6ad2699314fe9f36b530}, isbn = {0-7803-7842-3}, keywords = {dblp}, pages = {245-248}, publisher = {IEEE}, timestamp = {2024-04-09T19:39:32.000+0200}, title = {A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics.}, url = {http://dblp.uni-trier.de/db/conf/cicc/cicc2003.html#SuSLYLXCHCDH03}, year = 2003 }