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%0 Journal Article
%1 journals/access/KimCAKLRDCK22
%A Kim, Honggyun
%A Chavan, Vijay D.
%A Aziz, Jamal
%A Ko, Byoungsu
%A Lee, Jae-Sung
%A Rho, Junsuk
%A Dongale, Tukaram D.
%A Choi, Kyeong-Keun
%A Kim, Deok-Kee
%D 2022
%J IEEE Access
%K dblp
%P 68724-68730
%T Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application.
%U http://dblp.uni-trier.de/db/journals/access/access10.html#KimCAKLRDCK22
%V 10
@article{journals/access/KimCAKLRDCK22,
added-at = {2024-02-05T00:00:00.000+0100},
author = {Kim, Honggyun and Chavan, Vijay D. and Aziz, Jamal and Ko, Byoungsu and Lee, Jae-Sung and Rho, Junsuk and Dongale, Tukaram D. and Choi, Kyeong-Keun and Kim, Deok-Kee},
biburl = {https://www.bibsonomy.org/bibtex/29d9b7278ce4ca705190d9d71085aab2d/dblp},
ee = {https://doi.org/10.1109/ACCESS.2022.3183593},
interhash = {1de09ab869e632047ebeb4e970de475e},
intrahash = {9d9b7278ce4ca705190d9d71085aab2d},
journal = {IEEE Access},
keywords = {dblp},
pages = {68724-68730},
timestamp = {2024-04-08T13:45:41.000+0200},
title = {Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application.},
url = {http://dblp.uni-trier.de/db/journals/access/access10.html#KimCAKLRDCK22},
volume = 10,
year = 2022
}
