A theoretical study on the ultrafast high-field transport transient
properties of electrons in 3C-SiC is performed within a parabolic and a
nonparabolic band scheme. In both cases, the transient regime before the
electron energy and drift velocity attain their steady-state is shown to
be shorter than 0.2 ps. When the applied electric field intensity is
higher than 300 kV/cm, an overshoot always occurs in the electron drift
velocity, which is more pronounced when band nonparabolicity is
considered. (C) 2000 Elsevier Science Ltd. All rights reserved.
%0 Journal Article
%1 WOS:000085040100012
%A Caetano, EWS
%A Bezerra, EF
%A Freire, VN
%A da Costa, JAP
%A da Silva, EF
%C THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND
%D 2000
%I PERGAMON-ELSEVIER SCIENCE LTD
%J SOLID STATE COMMUNICATIONS
%K electronic transport} {semiconductors;
%N 9
%P 539-542
%R 10.1016/S0038-1098(99)00522-0
%T Ultrafast electron drift velocity overshoot in 3C-SiC
%V 113
%X A theoretical study on the ultrafast high-field transport transient
properties of electrons in 3C-SiC is performed within a parabolic and a
nonparabolic band scheme. In both cases, the transient regime before the
electron energy and drift velocity attain their steady-state is shown to
be shorter than 0.2 ps. When the applied electric field intensity is
higher than 300 kV/cm, an overshoot always occurs in the electron drift
velocity, which is more pronounced when band nonparabolicity is
considered. (C) 2000 Elsevier Science Ltd. All rights reserved.
@article{WOS:000085040100012,
abstract = {A theoretical study on the ultrafast high-field transport transient
properties of electrons in 3C-SiC is performed within a parabolic and a
nonparabolic band scheme. In both cases, the transient regime before the
electron energy and drift velocity attain their steady-state is shown to
be shorter than 0.2 ps. When the applied electric field intensity is
higher than 300 kV/cm, an overshoot always occurs in the electron drift
velocity, which is more pronounced when band nonparabolicity is
considered. (C) 2000 Elsevier Science Ltd. All rights reserved.},
added-at = {2022-05-23T20:00:14.000+0200},
address = {THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND},
author = {Caetano, EWS and Bezerra, EF and Freire, VN and da Costa, JAP and da Silva, EF},
biburl = {https://www.bibsonomy.org/bibtex/267bacccb02215d4d29c098dcf961dc7e/ppgfis_ufc_br},
doi = {10.1016/S0038-1098(99)00522-0},
interhash = {fa5a3276be63ea9f85c0be18c750dae9},
intrahash = {67bacccb02215d4d29c098dcf961dc7e},
issn = {0038-1098},
journal = {SOLID STATE COMMUNICATIONS},
keywords = {electronic transport} {semiconductors;},
number = 9,
pages = {539-542},
publisher = {PERGAMON-ELSEVIER SCIENCE LTD},
pubstate = {published},
timestamp = {2022-05-23T20:00:14.000+0200},
title = {Ultrafast electron drift velocity overshoot in 3C-SiC},
tppubtype = {article},
volume = 113,
year = 2000
}