Аннотация

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.

Описание

Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting - Nano Letters (ACS Publications)

Линки и ресурсы

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