Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
Описание
Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting - Nano Letters (ACS Publications)
%0 Journal Article
%1 hagberg2007effects
%A Hagberg, Erik C.
%A Malkoch, Michael
%A Ling, Yibo
%A Hawker, Craig J.
%A Carter, Kenneth R.
%D 2007
%J Nano Letters
%K nextgen thiolene topography
%N 2
%P 233--237
%R 10.1021/nl061217f
%T Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting
%U http://dx.doi.org/10.1021/nl061217f
%V 7
%X Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
@article{hagberg2007effects,
abstract = { Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed. },
added-at = {2016-12-16T09:49:51.000+0100},
author = {Hagberg, Erik C. and Malkoch, Michael and Ling, Yibo and Hawker, Craig J. and Carter, Kenneth R.},
biburl = {https://www.bibsonomy.org/bibtex/27d3b0dd7276702da4b1e8234956eaf21/bkoch},
description = {Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting - Nano Letters (ACS Publications)},
doi = {10.1021/nl061217f},
eprint = {http://dx.doi.org/10.1021/nl061217f},
interhash = {094f6b067785ca2bf1f837e3809c1d93},
intrahash = {7d3b0dd7276702da4b1e8234956eaf21},
journal = {Nano Letters},
keywords = {nextgen thiolene topography},
note = {PMID: 17243748},
number = 2,
pages = {233--237},
timestamp = {2016-12-16T09:49:51.000+0100},
title = {Effects of Modulus and Surface Chemistry of Thiol-Ene Photopolymers in Nanoimprinting},
url = {http://dx.doi.org/10.1021/nl061217f},
volume = 7,
year = 2007
}