Various attempts have been undertaken to reduce the compressive stress
of c-BN thin films. An obvious decrease in stress was realized by
post-deposition annealing up to 900 ?C, as well as by film deposition
with reduced bias after c-BN nucleation. A combined deposition/in-situ
annealing (at 700 ?C) multi-cycle process promotes improved film
adhesion, and when implemented together with reduced ion impact during
deposition, leads to additional stress relaxation for c-BN films.
%0 Journal Article
%1 Sell02
%A Sell, K.
%A Holleck, H.
%A Leiste, H.
%A St?ber, M.
%A Ulrich, S.
%A Ye, J.
%D 2002
%J Diamond and Related Materials
%K Annealing; Cubic Sputtering; Stress boron nitride;
%N 3-6
%P 1272--1275
%R doi:10.1016/S0925-9635(01)00738-5
%T Synthesis and characterization of cubic boron nitride films: investigations
of growth and annealing processes
%V 11
%X Various attempts have been undertaken to reduce the compressive stress
of c-BN thin films. An obvious decrease in stress was realized by
post-deposition annealing up to 900 ?C, as well as by film deposition
with reduced bias after c-BN nucleation. A combined deposition/in-situ
annealing (at 700 ?C) multi-cycle process promotes improved film
adhesion, and when implemented together with reduced ion impact during
deposition, leads to additional stress relaxation for c-BN films.
@article{Sell02,
abstract = {Various attempts have been undertaken to reduce the compressive stress
of c-BN thin films. An obvious decrease in stress was realized by
post-deposition annealing up to 900 ?C, as well as by film deposition
with reduced bias after c-BN nucleation. A combined deposition/in-situ
annealing (at 700 ?C) multi-cycle process promotes improved film
adhesion, and when implemented together with reduced ion impact during
deposition, leads to additional stress relaxation for c-BN films.},
added-at = {2009-11-05T12:01:24.000+0100},
author = {Sell, K. and Holleck, H. and Leiste, H. and St?ber, M. and Ulrich, S. and Ye, J.},
biburl = {https://www.bibsonomy.org/bibtex/2ebe704f39eb9f4dd0b816b8fc1f924eb/ghuot},
doi = {doi:10.1016/S0925-9635(01)00738-5},
file = {Shell2002.pdf:C\:\\Documents and Settings\\Guillaume\\Bureau\\ACERDE\\Articles\\BN\\Shell2002.pdf:PDF},
interhash = {75c7c180683550100fcc106a302dde54},
intrahash = {ebe704f39eb9f4dd0b816b8fc1f924eb},
journal = {Diamond and Related Materials},
keywords = {Annealing; Cubic Sputtering; Stress boron nitride;},
number = {3-6},
owner = {Guillaume},
pages = {1272--1275},
timestamp = {2009-11-05T12:01:34.000+0100},
title = {Synthesis and characterization of cubic boron nitride films: investigations
of growth and annealing processes},
volume = { 11},
year = { 2002}
}