%0 Journal Article %1 Peiro2002 %A Peiro, AM %A Vigil, E %A Peral, J %A Domingo, C %A Domenech, X %A Ayllon, JA %C PO BOX 564, 1001 LAUSANNE, SWITZERLAND %D 2002 %I ELSEVIER SCIENCE SA %J THIN SOLID FILMS %K deposition microwave; oxide; process; processing soft-solution titanium %N 2 %P 185-191 %T Titanium(IV) oxide thin films obtained by a two-step soft-solution method %V 411 %X TiO2 films were deposited on either glass or Si substrates by using a two-step soft-solution method. A submonolayer of anatase TiO2 nanocrystals was first deposited on the substrate by a drain-coating process that was performed at 333 K from an aqueous TiO2 colloidal solution. The substrate partially covered with the TiO2 nanocrystals was immersed in an aqueous solution, containing a titania precursor fluorine-complexed Ti(IV), and the whole was treated with microwave irradiation. The nanocrystals deposited on the substrate acted as growth seeds in the subsequent formation of the TiO2 film. The obtained TiO2 films showed a high degree of crystallinity (anatase), even without further thermal treatment; however, they did not show photocatalytic activity. Thickness of the films was varied as a function of microwave power and irradiation time. (C) 2002 Elsevier Science B.V. All rights reserved.

@article{Peiro2002, abstract = {TiO2 films were deposited on either glass or Si substrates by using a two-step soft-solution method. A submonolayer of anatase TiO2 nanocrystals was first deposited on the substrate by a drain-coating process that was performed at 333 K from an aqueous TiO2 colloidal solution. The substrate partially covered with the TiO2 nanocrystals was immersed in an aqueous solution, containing a titania precursor {[}fluorine-complexed Ti(IV)], and the whole was treated with microwave irradiation. The nanocrystals deposited on the substrate acted as growth seeds in the subsequent formation of the TiO2 film. The obtained TiO2 films showed a high degree of crystallinity (anatase), even without further thermal treatment; however, they did not show photocatalytic activity. Thickness of the films was varied as a function of microwave power and irradiation time. (C) 2002 Elsevier Science B.V. All rights reserved.}, added-at = {2009-02-13T13:09:53.000+0100}, address = {PO BOX 564, 1001 LAUSANNE, SWITZERLAND}, affiliation = {Ayllon, JA (Reprint Author), Univ Autonoma Barcelona, Dept Quim, Edificio Cn,Campus UAB, Bellaterra 08193, Spain. Univ Autonoma Barcelona, Dept Quim, Bellaterra 08193, Spain. Univ La Habana, Fac Fis, Inst Mat \& Reactivos, Cuidad Habana, Cuba. CSIC, Inst Ciencia Mat Barcelona, Bellaterra 08193, Spain.}, author = {Peiro, AM and Vigil, E and Peral, J and Domingo, C and Domenech, X and Ayllon, JA}, biburl = {https://www.bibsonomy.org/bibtex/2ee6bf8daf45f342459562c49a57909f1/almailer}, cited-references = {AYLLON JA, 2000, J MATER CHEM, V10, P1911. BYRNE JA, 1998, APPL CATAL B-ENVIRON, V17, P25. DEKI S, 1996, CHEM LETT, P433. DOESWIJK LM, 1999, APPL PHYS A-MATER S, V69, S409. HARIZANOV O, 2000, SOL ENERG MAT SOL C, V63, P185. IZUMI F, 1978, B CHEM SOC JPN, V51, P1771. JIN J, 2000, THIN SOLID FILMS, V379, P218. KALIWOH N, 2000, SURF COAT TECH, V125, P424. KAY A, 1996, SOL ENERG MAT SOL C, V44, P99. KOSHIMOTO H, 1998, J MATER CHEM, V8, P2019. LARCHER D, 2000, INT J INORG MATER, V2, P389. LEE TW, 2000, COMPUT MATH APPL, V39, P1. LEE WG, 1994, THIN SOLID FILMS, V237, P105. LI YX, 1999, SOL ENERG MAT SOL C, V56, P167. LIN H, 1998, THIN SOLID FILMS, V315, P111. LIN H, 1999, MOL CRYST LIQ CRYST, V337, P217. MARDARE D, 2000, APPL SURF SCI, V156, P200. MARTINET C, 1997, J NON-CRYST SOLIDS, V216, P77. MINERO C, 2000, LANGMUIR, V16, P2632. PEIRO AM, 2001, CHEM MATER, V13, P2567. SAADOUN L, 2000, MAT RES B, V35, P325. SCHVISKY M, 2000, J ELECTROCHEM SOC, V147, P3319. SHIMIZU K, 1999, THIN SOLID FILMS, V351, P220. SHIN H, 1995, J MATER RES, V10, P692. VANDERZANDEN B, 2000, J PHYS CHEM B, V104, P7171. VIGIL E, 1999, J MATER SCI LETT, V18, P1067. VIGIL E, 2000, THIN SOLID FILMS, V365, P12. VIGIL E, 2001, LANGMUIR, V17, P891. WU ZB, 2000, THIN SOLID FILMS, V375, P46. XIAO ZD, 1998, APPL SURF SCI, V125, P85. YOSHIMURA M, 1998, J MATER RES, V13, P796. YU J, 2000, THIN SOLID FILMS, V376, P7.}, description = {Initial Import}, file = {:Peiro2002.pdf:PDF}, interhash = {62960303df34c737541a452502fc54f5}, intrahash = {ee6bf8daf45f342459562c49a57909f1}, issn = {0040-6090}, journal = {THIN SOLID FILMS}, keywords = {deposition microwave; oxide; process; processing soft-solution titanium}, keywords-plus = {CHEMICAL-VAPOR-DEPOSITION; SELF-ASSEMBLED MONOLAYERS; LOW-TEMPERATURE SYNTHESIS; SOL-GEL METHOD; AQUEOUS-SOLUTIONS; TIO2 COATINGS; DIOXIDE FILMS; POWDERS; LAYERS; CELLS}, month = {MAY 31}, number = 2, owner = {s0346678}, pages = {185-191}, publisher = {ELSEVIER SCIENCE SA}, review = {Reports a technique for producing crystalline films of TiO2 on silicon and FTO-coated glass of thickness 100-500nm. Substrate is cleaned, then dipped in aqueous TiO2 colloidal suspension to form a thin seeding layer, then dipped in a titanate precursor solution to produce the crystalline layer, and after evaporation of solvents then irradiated with microwaves to produce firmly adhered crystalline films. All done at room pressure and 50C. Also references earlier work by the same group on drain-coating, where the substrate is immersed for 5 minutes and then the surrounding liquid drained off at a controlled, slow rate, leaving a film behind on the substrate which was firmly attached.}, times-cited = {14}, timestamp = {2009-02-13T13:09:55.000+0100}, title = {Titanium(IV) oxide thin films obtained by a two-step soft-solution method}, type = {Article}, unique-id = {ISI:000177179400002}, volume = 411, year = 2002 }