%0 Journal Article %1 journals/ibmrd/DhaliwalEGGKLPPRRST01 %A Dhaliwal, Rajinder S. %A Enichen, William A. %A Golladay, Steven D. %A Gordon, Michael S. %A Kendall, Rodney A. %A Lieberman, Jon E. %A Pfeiffer, Hans C. %A Pinckney, David J. %A Robinson, Christopher F. %A Rockrohr, James D. %A Stickel, Werner %A Tressler, Eileen V. %D 2001 %J IBM J. Res. Dev. %K dblp %N 5 %P 615-638 %T PREVAIL-Electron projection technology approach for next-generation lithography. %U http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd45.html#DhaliwalEGGKLPPRRST01 %V 45

@article{journals/ibmrd/DhaliwalEGGKLPPRRST01, added-at = {2020-03-13T00:00:00.000+0100}, author = {Dhaliwal, Rajinder S. and Enichen, William A. and Golladay, Steven D. and Gordon, Michael S. and Kendall, Rodney A. and Lieberman, Jon E. and Pfeiffer, Hans C. and Pinckney, David J. and Robinson, Christopher F. and Rockrohr, James D. and Stickel, Werner and Tressler, Eileen V.}, biburl = {https://www.bibsonomy.org/bibtex/2f2d8baa8b97515eed01d7a3abde443ad/dblp}, ee = {https://doi.org/10.1147/rd.455.0615}, interhash = {3e700fab06687d0154464c72d54c9aad}, intrahash = {f2d8baa8b97515eed01d7a3abde443ad}, journal = {IBM J. Res. Dev.}, keywords = {dblp}, number = 5, pages = {615-638}, timestamp = {2020-03-14T11:50:01.000+0100}, title = {PREVAIL-Electron projection technology approach for next-generation lithography.}, url = {http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd45.html#DhaliwalEGGKLPPRRST01}, volume = 45, year = 2001 }