%0 Conference Paper %1 conf/vlsit/NogamiGSNPHSLPS22 %A Nogami, Takeshi %A Gluschenkov, Oleg %A Sulehria, Yasir %A Nguyen, Son %A Peethala, Brown %A Huang, Huai %A Shobha, Hosadurga %A Lanzillo, Nick A. %A Patlolla, Raghuveer %A Sil, Devika %A Simon, Andrew %A Edelstein, Daniel %A Felix, Nelson %A Liu, Junjun %A Tabata, Toshiyuki %A Mazzamuto, Fulvio %A Halty, Sebastien %A Rozé, Fabien %A Okuno, Yasutoshi %A Uedono, Akira %B VLSI Technology and Circuits %D 2022 %I IEEE %K dblp %P 423-424 %T Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects. %U http://dblp.uni-trier.de/db/conf/vlsit/vlsit2022.html#NogamiGSNPHSLPS22 %@ 978-1-6654-9772-5

@inproceedings{conf/vlsit/NogamiGSNPHSLPS22, added-at = {2024-10-18T00:00:00.000+0200}, author = {Nogami, Takeshi and Gluschenkov, Oleg and Sulehria, Yasir and Nguyen, Son and Peethala, Brown and Huang, Huai and Shobha, Hosadurga and Lanzillo, Nick A. and Patlolla, Raghuveer and Sil, Devika and Simon, Andrew and Edelstein, Daniel and Felix, Nelson and Liu, Junjun and Tabata, Toshiyuki and Mazzamuto, Fulvio and Halty, Sebastien and Rozé, Fabien and Okuno, Yasutoshi and Uedono, Akira}, biburl = {https://www.bibsonomy.org/bibtex/2b583336907d46cdae2f5c2d1db0cc51e/dblp}, booktitle = {VLSI Technology and Circuits}, crossref = {conf/vlsit/2022}, ee = {https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830488}, interhash = {5421634a54f3b15fd09568842a721f70}, intrahash = {b583336907d46cdae2f5c2d1db0cc51e}, isbn = {978-1-6654-9772-5}, keywords = {dblp}, pages = {423-424}, publisher = {IEEE}, timestamp = {2024-10-21T07:24:05.000+0200}, title = {Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects.}, url = {http://dblp.uni-trier.de/db/conf/vlsit/vlsit2022.html#NogamiGSNPHSLPS22}, year = 2022 }