%0 Journal Article %1 Rel:Muhlstein01 %A Muhlstein, C.L. %A Brown, S.B. %A Ritchie, R.O. %D 2001 %J Microelectromechanical Systems, Journal of %K 20 30 48 C, Si Si, accumulation, alternating beams, brittle cantilever cycle damage day, devices, elemental evaluation, failure, fatigue, films films, fracture high materials, mechanics, micromechanical micron, notched premature s semiconductor semiconductors, silicon10 single-crystal stresses, surface thin to %N 4 %P 593-600 %R 10.1109/84.967383 %T High-cycle fatigue of single-crystal silicon thin films %V 10

@article{Rel:Muhlstein01, added-at = {2009-07-13T16:53:55.000+0200}, author = {Muhlstein, C.L. and Brown, S.B. and Ritchie, R.O.}, biburl = {https://www.bibsonomy.org/bibtex/2b7f5add3add77809a007b662afd1a205/enodev}, description = {rfmems}, doi = {10.1109/84.967383}, interhash = {963e0dc9bd7425965b5402ecd1e7ce15}, intrahash = {b7f5add3add77809a007b662afd1a205}, issn = {1057-7157}, journal = {Microelectromechanical Systems, Journal of}, keywords = {20 30 48 C, Si Si, accumulation, alternating beams, brittle cantilever cycle damage day, devices, elemental evaluation, failure, fatigue, films films, fracture high materials, mechanics, micromechanical micron, notched premature s semiconductor semiconductors, silicon10 single-crystal stresses, surface thin to}, month = Dec, number = 4, pages = {593-600}, timestamp = {2009-07-14T08:40:47.000+0200}, title = {High-cycle fatigue of single-crystal silicon thin films}, volume = 10, year = 2001 }