%0 Conference Paper %1 conf/irps/WuCDHC20 %A Wu, Chen %A Chasin, Adrian Vaisman %A Demuynck, Steven %A Horiguchi, Naoto %A Croes, Kris %B IRPS %D 2020 %I IEEE %K dblp %P 1-6 %T Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer Dielectric Stacks in Middle of Line Interconnects. %U http://dblp.uni-trier.de/db/conf/irps/irps2020.html#WuCDHC20 %@ 978-1-7281-3199-3

@inproceedings{conf/irps/WuCDHC20, added-at = {2023-05-24T00:00:00.000+0200}, author = {Wu, Chen and Chasin, Adrian Vaisman and Demuynck, Steven and Horiguchi, Naoto and Croes, Kris}, biburl = {https://www.bibsonomy.org/bibtex/2051e412cf46dfa018d23dacd322e5d2f/dblp}, booktitle = {IRPS}, crossref = {conf/irps/2020}, ee = {https://doi.org/10.1109/IRPS45951.2020.9128328}, interhash = {34d55f8a1dd898286368e031d83b0f57}, intrahash = {051e412cf46dfa018d23dacd322e5d2f}, isbn = {978-1-7281-3199-3}, keywords = {dblp}, pages = {1-6}, publisher = {IEEE}, timestamp = {2024-04-10T16:56:46.000+0200}, title = {Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer Dielectric Stacks in Middle of Line Interconnects.}, url = {http://dblp.uni-trier.de/db/conf/irps/irps2020.html#WuCDHC20}, year = 2020 }