%0 Journal Article %1 journals/mr/HuangWLZZTZLW11 %A Huang, Ru %A Wang, Runsheng %A Liu, Changze %A Zhang, Liangliang %A Zhuge, Jing %A Tao, Yu %A Zou, Jinbin %A Liu, Yuchao %A Wang, Yangyuan %D 2011 %J Microelectron. Reliab. %K dblp %N 9-11 %P 1515-1520 %T HCI and NBTI induced degradation in gate-all-around silicon nanowire transistors. %U http://dblp.uni-trier.de/db/journals/mr/mr51.html#HuangWLZZTZLW11 %V 51

@article{journals/mr/HuangWLZZTZLW11, added-at = {2020-02-22T00:00:00.000+0100}, author = {Huang, Ru and Wang, Runsheng and Liu, Changze and Zhang, Liangliang and Zhuge, Jing and Tao, Yu and Zou, Jinbin and Liu, Yuchao and Wang, Yangyuan}, biburl = {https://www.bibsonomy.org/bibtex/2028a1b631b7e13e149380afd2eeef168/dblp}, ee = {https://doi.org/10.1016/j.microrel.2011.07.080}, interhash = {8ab94695571d3073ce0f3ae1346a3307}, intrahash = {028a1b631b7e13e149380afd2eeef168}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = {9-11}, pages = {1515-1520}, timestamp = {2020-02-25T13:28:32.000+0100}, title = {HCI and NBTI induced degradation in gate-all-around silicon nanowire transistors.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr51.html#HuangWLZZTZLW11}, volume = 51, year = 2011 }