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%0 Journal Article
%1 journals/ibmrd/GrovesHPPB93
%A Groves, Timothy R.
%A Hartley, John G.
%A Pfeiffer, Hans C.
%A Puisto, Denise
%A Bailey, Donald K.
%D 1993
%J IBM J. Res. Dev.
%K dblp
%N 3
%P 411-420
%T Electron beam lithography tool for manufacture of X-ray masks.
%U http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd37.html#GrovesHPPB93
%V 37
@article{journals/ibmrd/GrovesHPPB93,
added-at = {2020-03-13T00:00:00.000+0100},
author = {Groves, Timothy R. and Hartley, John G. and Pfeiffer, Hans C. and Puisto, Denise and Bailey, Donald K.},
biburl = {https://www.bibsonomy.org/bibtex/2f44a0128afe6e769b16f679751037728/dblp},
ee = {https://doi.org/10.1147/rd.373.0411},
interhash = {b11c8fc52df4a9662cafeccabece40c9},
intrahash = {f44a0128afe6e769b16f679751037728},
journal = {IBM J. Res. Dev.},
keywords = {dblp},
number = 3,
pages = {411-420},
timestamp = {2020-03-14T11:49:18.000+0100},
title = {Electron beam lithography tool for manufacture of X-ray masks.},
url = {http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd37.html#GrovesHPPB93},
volume = 37,
year = 1993
}