%0 Journal Article %1 journals/ibmrd/GrovesHPPB93 %A Groves, Timothy R. %A Hartley, John G. %A Pfeiffer, Hans C. %A Puisto, Denise %A Bailey, Donald K. %D 1993 %J IBM J. Res. Dev. %K dblp %N 3 %P 411-420 %T Electron beam lithography tool for manufacture of X-ray masks. %U http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd37.html#GrovesHPPB93 %V 37

@article{journals/ibmrd/GrovesHPPB93, added-at = {2020-03-13T00:00:00.000+0100}, author = {Groves, Timothy R. and Hartley, John G. and Pfeiffer, Hans C. and Puisto, Denise and Bailey, Donald K.}, biburl = {https://www.bibsonomy.org/bibtex/2f44a0128afe6e769b16f679751037728/dblp}, ee = {https://doi.org/10.1147/rd.373.0411}, interhash = {b11c8fc52df4a9662cafeccabece40c9}, intrahash = {f44a0128afe6e769b16f679751037728}, journal = {IBM J. Res. Dev.}, keywords = {dblp}, number = 3, pages = {411-420}, timestamp = {2020-03-14T11:49:18.000+0100}, title = {Electron beam lithography tool for manufacture of X-ray masks.}, url = {http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd37.html#GrovesHPPB93}, volume = 37, year = 1993 }