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CAD computation for manufacturability: can we save VLSI technology from itself?

, и . ICCAD, стр. 424-431. ACM / IEEE Computer Society, (2002)

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Claus Liebmann

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Application of automated design migration to alternating phase shift mask design., , и . ISPD, стр. 38-43. ACM, (2001)A Designer's Guide to Subresolution Lithography: Enabling the Impossible to Get to the 14-nm Node Tutorial., и . IEEE Des. Test, 30 (3): 70-92 (2013)Pushing multiple patterning in sub-10nm: are we ready?, , , , и . DAC, стр. 197:1-197:6. ACM, (2015)Layout Decomposition and Legalization for Double-Patterning Technology., , , , , и . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 32 (2): 202-215 (2013)CAD computation for manufacturability: can we save VLSI technology from itself?, и . ICCAD, стр. 424-431. ACM / IEEE Computer Society, (2002)TCAD development for lithography resolution enhancement., , , , , и . IBM J. Res. Dev., 45 (5): 651-666 (2001)Coupling timing objectives with optical proximity correction for improved timing yield., , , , , и . ISQED, стр. 97-102. IEEE, (2011)Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings., , , , , и . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 29 (4): 509-527 (2010)Layout impact of resolution enhancement techniques: impediment or opportunity?. ISPD, стр. 110-117. ACM, (2003)Electrically driven optical proximity correction based on linear programming., , , и . ICCAD, стр. 473-479. IEEE Computer Society, (2008)