Author of the publication

Review and big data perspectives on robust data mining approaches for industrial process modeling with outliers and missing data.

, , , and . Annu. Rev. Control., (2018)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

Distributed Parallel PCA for Modeling and Monitoring of Large-Scale Plant-Wide Processes With Big Data., , and . IEEE Trans. Ind. Informatics, 13 (4): 1877-1885 (2017)Scalable Soft Sensor for Nonlinear Industrial Big Data via Bagging Stochastic Variational Gaussian Processes., , , , and . IEEE Trans. Ind. Electron., 68 (8): 7594-7602 (2021)Process monitoring using recurrent Kalman variational auto-encoder for general complex dynamic processes., , , and . Eng. Appl. Artif. Intell., 123 (Part C): 106424 (2023)Real-time Traffic Incident Detection Using an Autoencoder Model., , , , and . ITSC, page 1-6. IEEE, (2020)Collaborative Multiple Players to Address Label Sparsity in Quality Prediction of Batch Processes., , , , and . Sensors, 24 (7): 2073 (April 2024)Toward Efficiently Evaluating the Robustness of Deep Neural Networks in IoT Systems: A GAN-Based Method., , , , , , and . IEEE Internet Things J., 9 (3): 1875-1884 (2022)Review and big data perspectives on robust data mining approaches for industrial process modeling with outliers and missing data., , , and . Annu. Rev. Control., (2018)Fault Detection and Diagnosis in Industrial Processes with Variational Autoencoder: A Comprehensive Study., , and . Sensors, 22 (1): 227 (2022)EnsDeepDP: An Ensemble Deep Learning Approach for Disease Prediction Through Metagenomics., , , , and . IEEE ACM Trans. Comput. Biol. Bioinform., 20 (2): 986-998 (March 2023)Similar Batch Process Monitoring With Orthogonal Subspace Alignment., and . IEEE Trans. Ind. Electron., 65 (10): 8173-8183 (2018)