( en | de | ru )

 

Disambiguation

From post

копироватьудалитьдобавить публикацию в буфер
Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination.

, , , , , , , , , , , , , и . IMW, стр. 1-4. IEEE, (2022)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed.

Pasquale Pirrone

Andreas Pirro

Franz Pirro

Pirro Bracka

Nicola Pirron

 

Другие публикации лиц с тем же именем

Comparison of Analog and Noise Performance between Buried Channel versus Surface Devices in HKMG I/O Devices., , , , , , , , , и 3 other автор(ы). IRPS, стр. 1-4. IEEE, (2021)RTN and LFN Noise Performance in Advanced FDSOI Technology., , , , , , , , , и 2 other автор(ы). ESSDERC, стр. 254-257. IEEE, (2018)Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination., , , , , , , , , и 4 other автор(ы). IMW, стр. 1-4. IEEE, (2022)Interfacial Layer Engineering to Enhance Noise Immunity of FeFETs for IMC Applications., , , , , , , , , и 3 other автор(ы). ICICDT, стр. 8-11. IEEE, (2022)Low-frequency noise in bare SOI wafers: Experiments and model., , , и . ESSDERC, стр. 286-289. IEEE, (2015)22FDX® fMAX Optimization through Parasitics Reduction and GM Boost., , , , , , , , , и 8 other автор(ы). ESSDERC, стр. 166-169. IEEE, (2019)Low-Frequency Noise Reduction in 22FDX®: Impact of Device Geometry and Back Bias., , , , , , , , и . IRPS, стр. 1-5. IEEE, (2019)Impact of Electrical Defects located at Transistor Periphery on Analog and RTN Device Performance., , , , , , , , , и 2 other автор(ы). IRPS, стр. 59-1. IEEE, (2022)