%0 Conference Paper %1 conf/essderc/JangBYMKCRDM13 %A Jang, Doyoung %A Bardon, Marie Garcia %A Yakimets, Dmitry %A Miyaguchi, Kenichi %A Keersgieter, An De %A Chiarella, Thomas %A Ritzenthaler, Romain %A Dehan, Morin %A Mercha, Abdelkarim %B ESSDERC %D 2013 %I IEEE %K dblp %P 159-162 %T STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process. %U http://dblp.uni-trier.de/db/conf/essderc/essderc2013.html#JangBYMKCRDM13

@inproceedings{conf/essderc/JangBYMKCRDM13, added-at = {2021-05-05T00:00:00.000+0200}, author = {Jang, Doyoung and Bardon, Marie Garcia and Yakimets, Dmitry and Miyaguchi, Kenichi and Keersgieter, An De and Chiarella, Thomas and Ritzenthaler, Romain and Dehan, Morin and Mercha, Abdelkarim}, biburl = {https://www.bibsonomy.org/bibtex/24fcac4a9aeed16e34cb68d8e88413617/dblp}, booktitle = {ESSDERC}, crossref = {conf/essderc/2013}, ee = {https://doi.org/10.1109/ESSDERC.2013.6818843}, interhash = {036e8e98879af9b615783ea101f67434}, intrahash = {4fcac4a9aeed16e34cb68d8e88413617}, keywords = {dblp}, pages = {159-162}, publisher = {IEEE}, timestamp = {2024-04-10T10:01:37.000+0200}, title = {STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process.}, url = {http://dblp.uni-trier.de/db/conf/essderc/essderc2013.html#JangBYMKCRDM13}, year = 2013 }