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Electrically driven optical proximity correction based on linear programming.

, , , and . ICCAD, page 473-479. IEEE Computer Society, (2008)

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Application of automated design migration to alternating phase shift mask design., , and . ISPD, page 38-43. ACM, (2001)Pushing multiple patterning in sub-10nm: are we ready?, , , , and . DAC, page 197:1-197:6. ACM, (2015)CAD computation for manufacturability: can we save VLSI technology from itself?, and . ICCAD, page 424-431. ACM / IEEE Computer Society, (2002)Coupling timing objectives with optical proximity correction for improved timing yield., , , , , and . ISQED, page 97-102. IEEE, (2011)Layout impact of resolution enhancement techniques: impediment or opportunity?. ISPD, page 110-117. ACM, (2003)Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings., , , , , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 29 (4): 509-527 (2010)A framework for double patterning-enabled design., , , , , and . ICCAD, page 14-20. IEEE Computer Society, (2011)Electrically driven optical proximity correction based on linear programming., , , and . ICCAD, page 473-479. IEEE Computer Society, (2008)Rules vs tools: what's the right way to address IC manufacturing complexity?, , , and . ISPD, page 75-76. ACM, (2007)Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking., , , and . DAC, page 79-84. ACM, (2001)