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Disambiguation of "Pankratov, E.L."

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ON APPROACH OF ESTIMATION TIME SCALES OF RELAXATION OF CONCENTRATION OF CHARGE CARRIERS IN HIGH-DOPED SEMICONDUCTOR

. International Journal of Information Technology, Modeling and Computing (IJITMC), 4 (3): 9 (August 2016)
DOI: 10.5121/ijitmc.2016.4301

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Oleg Pankratov

 

Other publications of authors with the same name

AN APPROACH TO OPTIMIZE OF MANUFACTURING OF A VOLTAGE REFERENCE BASED ON HETEROSTRUCTURES TO INCREASE DENSITY OF THEIR ELEMENTS. ANALYSIS OF INFLUENCE OF MISS-MATCH INDUCED STRESS AND POROSITY OF MATERIALS ON TECHNOLOGICAL PROCESS. International Journal of Advance Robotics & Expert Systems (JARES), 1 (2): 41 - 60 (2018)ON OPTIMIZATION OF MANUFACTURING PLANAR DOUBLE-BASE HETEROTRANSISTORS TO DECREASE THEIR DIMENSIONS, and . The International Journal of Applied Control, Electrical and Electronics Engineering, 3 (4): 12 (November 2015)On Vertical Integration Framework Element of Transistor-Transistor Logic. International Journal of Applied Control, Electrical and Electronics Engineering (IJACEEE), 3 (3): 1-23 (August 2015)ON APPROACH TO ANALYZE NONLINEAR MODEL OF MASS AND HEAT TRANSPORT DURING GAS PHASE EPITAXY. A POSSIBILITY TO IMPROVE PROPERTIES OF FILMS, and . International Journal on Organic Electronics (IJOE), 6 (4): 12 (October 2017)INFLUENCE OF OVERLAYERS ON DEPTH OF IMPLANTED-HETEROJUNCTION RECTIFIERS, and . International Journal of Information Technology, Modeling and Computing (IJITMC), 4 (1): 15 (February 2016)OPTIMIZATION OF MANUFACTURE OF FIELDEFFECT HETEROTRANSISTORS WITHOUT P-NJUNCTIONS TO DECREASE THEIR DIMENSIONS. International Journal of Recent advances in Physics (IJRAP), 3 (3): 1-16 (August 2014)Optimization of Dopant Diffusion and Ion Implantation to Increase Integration Rate of Field-Effect Heterotransistors. An Ap-Proach to Simplify Construction of the Heterotransistors, and . International Journal of Recent Advances in Physics (IJRAP), 4 (1): 12 (February 2015)ON OPTIMIZATION OF MANUFACTURING OF ELEMENTS OF AN BINARY-ROM CIRCUIT TO INCREASE THEIR INTEGRATION RATE. International Journal of Advance Robotics & Expert Systems (JARES), 1 (3): 23 - 43 (2018)On Optimization of Manufacturing Planar Double-Base Heterotransistors To Decrease Their Dimensions. International Journal of Applied Control, Electrical and Electronics Engineering (IJACEEE), 3 (4): 13-24 (November 2015)INFLUENCE OF OVERLAYERS ON DEPTH OF IMPLANTED-HETEROJUNCTION RECTIFIERS. International Journal of Information Technology, Modeling and Computing (IJITMC), 4 (1): 15 (February 2016)