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Double-sided Row Hammer Effect in Sub-20 nm DRAM: Physical Mechanism, Key Features and Mitigation.

, , , , , , , , , , and . IRPS, page 1-10. IEEE, (2023)

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Comparative Study on the Energy Distribution of Defects under HCD and NBTI in Short Channel p-FinFETs., , , , , , , and . IRPS, page 1-5. IEEE, (2021)Characterization and Modelling of Hot Carrier Degradation in pFETs under Vd>Vg Condition for sub-20nm DRAM Technologies., , , , , , , and . IRPS, page 7. IEEE, (2022)Comparative Study on the Energy Profile of NBTI-Related Defects in Si and Ferroelectric p-FinFETs., , , , , , , and . IRPS, page 1-6. IEEE, (2020)Convolution-Based Vth Shift Prediction and the New 9T2C Pixel Circuit in LTPS TFT AMOLED., , , , , , , , , and . IRPS, page 1-7. IEEE, (2024)New Insight into the Aging Induced Retention Time Degraded of Advanced DRAM Technology., , , , , , , and . IRPS, page 6. IEEE, (2022)Understanding the Physical Mechanism of RowPress at the Device-Level in Sub-20 nm DRAM., , , , , , and . IRPS, page 1-6. IEEE, (2024)A Fast DCIV Technique for Characterizing the Generation and Repassivation of Interface Traps Under DC/ AC NBTI Stress/Recovery Condition in Si p-FinFETs., , , , , , , , , and 2 other author(s). IRPS, page 1-7. IEEE, (2021)Double-sided Row Hammer Effect in Sub-20 nm DRAM: Physical Mechanism, Key Features and Mitigation., , , , , , , , , and 1 other author(s). IRPS, page 1-10. IEEE, (2023)