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A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.

J. Yang, K. Lu, M. Cho, K. Yuan, and D. Pan. ASP-DAC, page 637-644. IEEE, (2010)

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Ghil-Seok Yang

In-Deok Seok

Joon-Weon Seok

Yang Yang

Other publications of authors with the same name

Double patterning layout decomposition for simultaneous conflict and stitch minimization.K. Yuan, J. Yang, and D. Pan. ISPD, page 107-114. ACM, (2009)Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner.J. Yang, and A. Neureuther. ISQED, page 352-356. IEEE Computer Society, (2008)Overlay aware interconnect and timing variation modeling for double patterning technology.J. Yang, and D. Pan. ICCAD, page 488-493. IEEE Computer Society, (2008)Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper).B. Yu, J. Gao, D. Ding, Y. Ban, J. Yang, K. Yuan, M. Cho, and D. Pan. ICCAD, page 240-242. ACM, (2012)Chemical-mechanical polishing aware application-specific 3D NoC design.W. Jang, O. He, J. Yang, and D. Pan. ICCAD, page 207-212. IEEE Computer Society, (2011)Stress-driven 3D-IC placement with TSV keep-out zone and regularity study.K. Athikulwongse, A. Chakraborty, J. Yang, D. Pan, and S. Lim. ICCAD, page 669-674. IEEE, (2010)Elimination of false aggressors using the functional relationship for full-chip crosstalk analysis.J. Yang, J. Kim, J. Choi, M. Yoo, and J. Kong. ISQED, page 344-347. IEEE Computer Society, (2003)Design for manufacturability and reliability for TSV-based 3D ICs.D. Pan, S. Lim, K. Athikulwongse, M. Jung, J. Mitra, J. Pak, M. Pathak, and J. Yang. ASP-DAC, page 750-755. IEEE, (2012)A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.J. Yang, K. Lu, M. Cho, K. Yuan, and D. Pan. ASP-DAC, page 637-644. IEEE, (2010)Layout aware line-edge roughness modeling and poly optimization for leakage minimization.Y. Ban, and J. Yang. DAC, page 447-452. ACM, (2011)

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Disambiguation of "Yang, Jae-Seok"

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A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.

Please choose a person to relate this publication to

Ghil-Seok Yang

In-Deok Seok

Joon-Weon Seok

Yang Yang

Yang Yang

Other publications of authors with the same name

Disambiguation

BibSonomy

Disambiguation of "Yang, Jae-Seok"

copydeleteadd this publication to your clipboardcommunity posthistory of this postURLDOIBibTeXEndNoteAPAChicagoDIN 1505HarvardMSOffice XML A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.

Please choose a person to relate this publication to

Ghil-Seok Yang

In-Deok Seok

Joon-Weon Seok

Yang Yang

Yang Yang

Other publications of authors with the same name

Disambiguation

copy delete add this publication to your clipboard
community post
history of this post
URL
DOI
BibTeX
EndNote
APA
Chicago
DIN 1505
Harvard
MSOffice XML

A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography.