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Enablement of CMOS integrated sensor, harvesting and storage applications by ferroelectric HfO2., , и . ICICDT, стр. 84-87. IEEE, (2022)IPCEI subcontracts contributing to 22-FDX Add-On Functionalities at GF., , , , , , , , , и 10 other автор(ы). ESSDERC, стр. 74-77. IEEE, (2019)La-doped ZrO2 based BEoL decoupling capacitors., , , , , , , и . ICICDT, стр. 1-4. IEEE, (2016)ALD Ta2O5 and Hf-doped Ta2O5 for BEOL compatible MIM., , , , , , , , , и 1 other автор(ы). ICICDT, стр. 1-4. IEEE, (2014)Piezoelectric response of polycrystalline silicon‐doped hafnium oxide thin films determined by rapid temperature cycles, , , , , , , , и . Adv. Electron. Mater., 6 (3): 1901015 (29.01.2020)CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures., , , , , и . ESSDERC, стр. 130-133. IEEE, (2018)ALD ZrO2 processes for BEoL device applications., , , , , , и . ICICDT, стр. 1-4. IEEE, (2014)