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A 5-GHz fully integrated ESD-protected low-noise amplifier in 90-nm RF CMOS., , , , , , , , , and . IEEE J. Solid State Circuits, 40 (7): 1434-1442 (2005)Demonstration of Bilayer Gate Insulator for Improved Reliability in GaN-on-Si Vertical Transistors., , , , , , , , , и . IRPS, стр. 1-5. IEEE, (2020)Time dependent dielectric breakdown (TDDB) evaluation of PE-ALD SiN gate dielectrics on AlGaN/GaN recessed gate D-mode MIS-HEMTs and E-mode MIS-FETs., , , , , , , , и . IRPS, стр. 6. IEEE, (2015)Technologies for (sub-) 45nm Analog/RF CMOS - Circuit Design Opportunities and Challenges., , , , и . CICC, стр. 679-686. IEEE, (2006)Breakdown investigation in GaN-based MIS-HEMT devices., , , , , , , , , и 2 other автор(ы). ESSDERC, стр. 377-380. IEEE, (2014)Trapping and reliability issues in GaN-based MIS HEMTs with partially recessed gate., , , , , , , , , и . Microelectron. Reliab., (2016)High- Temperature PBTI in Trench-Gate Vertical GaN Power MOSFETs: Role of Border and Semiconductor Traps., , , , , , , , , и 1 other автор(ы). IRPS, стр. 1-6. IEEE, (2023)Influence of Drain and Gate Potential on Gate Failure in Semi-Vertical GaN-on-Si Trench MOSFETs., , , , , , , , , и 1 other автор(ы). IRPS, стр. 20-1. IEEE, (2022)Gate Reliability of p-GaN Power HEMTs Under Pulsed Stress Condition., , , , , , , и . IRPS, стр. 10. IEEE, (2022)The Potential of FinFETs for Analog and RF Circuit Applications., , , , , , , , , и 5 other автор(ы). IEEE Trans. Circuits Syst. I Regul. Pap., 54-I (11): 2541-2551 (2007)