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12.1 A 7nm 256Mb SRAM in high-k metal-gate FinFET technology with write-assist circuitry for low-VMIN applications., , , , , , , , , и 6 other автор(ы). ISSCC, стр. 206-207. IEEE, (2017)13.5 A 16nm 128Mb SRAM in high-κ metal-gate FinFET technology with write-assist circuitry for low-VMIN applications., , , , , , , , , и 4 other автор(ы). ISSCC, стр. 238-239. IEEE, (2014)17.2 A 64kb 16nm asynchronous disturb current free 2-port SRAM with PMOS pass-gates for FinFET technologies., , , , , , , , , и 2 other автор(ы). ISSCC, стр. 1-3. IEEE, (2015)A 16 nm 128 Mb SRAM in High-κ Metal-Gate FinFET Technology With Write-Assist Circuitry for Low-VMIN Applications., , , , , , , , , и 2 other автор(ы). IEEE J. Solid State Circuits, 50 (1): 170-177 (2015)A 3nm 256Mb SRAM in FinFET Technology with New Array Banking Architecture and Write-Assist Circuitry Scheme for High-Density and Low-VMIN Applications., , , , , , , , , и 8 other автор(ы). VLSI Technology and Circuits, стр. 1-2. IEEE, (2023)A 16nm dual-port SRAM with partial suppressed word-line, dummy read recovery and negative bit-line circuitries for low VMIN applications., , , , , , и . VLSI Circuits, стр. 1-2. IEEE, (2016)A 7nm 2.1GHz Dual-Port SRAM with WL-RC Optimization and Dummy-Read-Recovery Circuitry to Mitigate Read- Disturb-Write Issue., , , , , , , , , и . ISSCC, стр. 390-392. IEEE, (2019)3.7-GHz Multi-Bank High-Current Single-Port Cache SRAM with 0.5V-1.4V Wide Voltage Range Operation in 3nm FinFET for HPC Applications., , , , , , , , и . VLSI Technology and Circuits, стр. 1-2. IEEE, (2023)