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DenTeach: A Device for Fostering Children's Good Tooth-brushing Habits., , , , and . IDC, page 619-624. ACM, (2016)STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process., , , , , , , , and . ESSDERC, page 159-162. IEEE, (2013)Impact of fin shape variability on device performance towards 10nm node., , , , , , , , , and 3 other author(s). ICICDT, page 1-4. IEEE, (2015)Lateral NWFET optimization for beyond 7nm nodes., , , , , , , , , and 3 other author(s). ICICDT, page 1-4. IEEE, (2015)5nm: Has the time for a device change come?, , , , , , , and . ISQED, page 275-277. IEEE, (2016)Design of a Shared-Aperture Dual-Loop Antenna Using a Mutual Complementary Shape to Improve an Electromagnetic Transparent Characteristics Between S/X-Band Elements., , , and . IEEE Access, (2024)Device Scaling roadmap and its implications for Logic and Analog platform., , , , , , and . BCICTS, page 1-8. IEEE, (2020)Device circuit and technology co-optimisation for FinFET based 6T SRAM cells beyond N7., , , , , , , , , and 2 other author(s). ESSDERC, page 256-259. IEEE, (2017)Design Technology co-optimization for N10., , , , , , , , , and 18 other author(s). CICC, page 1-8. IEEE, (2014)Dimensioning for power and performance under 10nm: The limits of FinFETs scaling., , , , , , , and . ICICDT, page 1-4. IEEE, (2015)