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Technologies for (sub-) 45nm Analog/RF CMOS - Circuit Design Opportunities and Challenges., , , , и . CICC, стр. 679-686. IEEE, (2006)Holisitic device exploration for 7nm node., , , , , , , , , и 5 other автор(ы). CICC, стр. 1-5. IEEE, (2015)Analysis of microbump induced stress effects in 3D stacked IC technologies., , , , , , , , , и 9 other автор(ы). 3DIC, стр. 1-5. IEEE, (2011)Design technology co-optimization for enabling 5nm gate-all-around nanowire 6T SRAM., , , , , , , и . ICICDT, стр. 1-4. IEEE, (2015)A 5-GHz fully integrated ESD-protected low-noise amplifier in 90-nm RF CMOS., , , , , , , , , и . IEEE J. Solid State Circuits, 40 (7): 1434-1442 (2005)Technology and architecture for deep submicron RF CMOS technology.. SBCCI, стр. 4. ACM, (2005)STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process., , , , , , , , и . ESSDERC, стр. 159-162. IEEE, (2013)Identifying the Bottlenecks to the RF Performance of FinFETs., , , , , , и . VLSI Design, стр. 111-116. IEEE Computer Society, (2010)A 5 GHz fully integrated ESD-protected low-noise amplifier in 90 nm RF CMOS., , , , , , , , , и . ESSCIRC, стр. 291-294. IEEE, (2004)Low-cost feedback-enabled LNAs in 45nm CMOS., , , , и . ESSCIRC, стр. 100-103. IEEE, (2009)