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A 16 nm 128 Mb SRAM in High-κ Metal-Gate FinFET Technology With Write-Assist Circuitry for Low-VMIN Applications., , , , , , , , , и 2 other автор(ы). IEEE J. Solid State Circuits, 50 (1): 170-177 (2015)A 20nm 112Mb SRAM in High-к metal-gate with assist circuitry for low-leakage and low-VMIN applications., , , , , , , , , и 5 other автор(ы). ISSCC, стр. 316-317. IEEE, (2013)17.2 A 64kb 16nm asynchronous disturb current free 2-port SRAM with PMOS pass-gates for FinFET technologies., , , , , , , , , и 2 other автор(ы). ISSCC, стр. 1-3. IEEE, (2015)A 4nm 6163-TOPS/W/b $4790-TOPS/mm^2/b$ SRAM Based Digital-Computing-in-Memory Macro Supporting Bit-Width Flexibility and Simultaneous MAC and Weight Update., , , , , , , , , и 8 other автор(ы). ISSCC, стр. 132-133. IEEE, (2023)A 3nm 256Mb SRAM in FinFET Technology with New Array Banking Architecture and Write-Assist Circuitry Scheme for High-Density and Low-VMIN Applications., , , , , , , , , и 8 other автор(ы). VLSI Technology and Circuits, стр. 1-2. IEEE, (2023)34.4 A 3nm, 32.5TOPS/W, 55.0TOPS/mm2 and 3.78Mb/mm2 Fully-Digital Compute-in-Memory Macro Supporting INT12 × INT12 with a Parallel-MAC Architecture and Foundry 6T-SRAM Bit Cell., , , , , , , , , и 13 other автор(ы). ISSCC, стр. 572-574. IEEE, (2024)A 64-Kb 0.37V 28nm 10T-SRAM with mixed-Vth read-port and boosted WL scheme for IoT applications., , , , , , , и . A-SSCC, стр. 185-188. IEEE, (2016)13.5 A 16nm 128Mb SRAM in high-κ metal-gate FinFET technology with write-assist circuitry for low-VMIN applications., , , , , , , , , и 4 other автор(ы). ISSCC, стр. 238-239. IEEE, (2014)A 5-nm 254-TOPS/W 221-TOPS/mm2 Fully-Digital Computing-in-Memory Macro Supporting Wide-Range Dynamic-Voltage-Frequency Scaling and Simultaneous MAC and Write Operations., , , , , , , , , и 8 other автор(ы). ISSCC, стр. 1-3. IEEE, (2022)12.1 A 7nm 256Mb SRAM in high-k metal-gate FinFET technology with write-assist circuitry for low-VMIN applications., , , , , , , , , и 6 other автор(ы). ISSCC, стр. 206-207. IEEE, (2017)